Citation

Kok, Soon Yie and Tou, Teck Yong and Yap, Seong Ling and Yap, Seong Shan (2016) Pulsed laser interference patterning of polyimide grating for dye-doped polymer laser. Journal of Nanophotonics, 10 (3). 033003(1)-033003(9). ISSN 1934-2608

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Abstract

Direct laser interference patterning of polyimide (PI) films was performed by using a pulsed 355-nm laser. At laser fluence of 0.4  J/cm2, gratings with spatial periods of 3.8  μm to 344 nm were created. The highest aspect ratio of the grating structure (0.8) was obtained for the 344-nm grating. An all-polymer dye laser was then fabricated by spin-coating a layer of disodium fluorescein (DF)-doped polyvinyl alcohol (PVA) film on bare and patterned PI substrate. Green laser emission was obtained when transversely pumped by a 355-nm laser. The lasing threshold reduced by ∼10 times for the sample with 344-nm grating while the laser intensity was ∼18 times higher. The enhancements are ascribed to the 344-nm grating structures, which act as an efficient distributed feedback resonator and distributed Bragg reflector grating for DF-doped PVA emitting at ∼563  nm, on top of being a passive light-trapping structures.

Item Type:	Article
Uncontrolled Keywords:	laser interference patterning; thin film dye laser; distributed feedback laser; distributed Bragg reflector; dye doped polymer laser; polyimide
Subjects:	T Technology > TP Chemical technology > TP1080-1185 Polymers and polymer manufacture
Divisions:	Faculty of Engineering (FOE)
Depositing User:	Ms Suzilawati Abu Samah
Date Deposited:	28 Nov 2017 15:12
Last Modified:	28 Nov 2017 15:12
URII:	http://shdl.mmu.edu.my/id/eprint/6517

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