Citation

Hoon, Jian Wei and Chan, Kah Yoong and Low, Cheng Yang (2013) XRD investigations on film thickness and substrate temperature effects of DC magnetron sputtered ZnO films. Advanced Material research, 845. pp. 241-245.

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Abstract

In this paper, direct current plasma magnetron sputter deposition technique was employed to deposit zinc oxide (ZnO) films on glass substrates. The magnetron sputtering process parameters including film thickness and substrate temperature were investigated. The crystallite sizes of the ZnO films were extracted from the measured X-ray diffraction patterns. The correlation of the crystallite size of the ZnO films with the film thickness and the substrate temperature will be discussed in this paper.

Item Type:	Article
Subjects:	T Technology > TA Engineering (General). Civil engineering (General)
Divisions:	Faculty of Engineering (FOE)
Depositing User:	Ms Nurul Iqtiani Ahmad
Date Deposited:	28 Feb 2014 02:43
Last Modified:	28 Feb 2014 02:43
URII:	http://shdl.mmu.edu.my/id/eprint/5333

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