Citation

SIM, K. S. and WHITE, J. D. (2005) New technique for in-situ measurement of backscattered and secondary electron yields for the calculation of signal-to-noise ratio in a SEM. Journal of Microscopy, 217 (3). pp. 235-240. ISSN 0022-2720

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Abstract

The quality of an image generated by a scanning electron microscope is dependent on secondary emission, which is a strong function of surface condition. Thus, empirical formulae and available databases are unable to take into account actual metrology conditions. This paper introduces a simple and reliable measurement technique to measure secondary electron yield (delta) and backscattered electron yield (eta) that is suitable for in-situ measurements on a specimen immediately prior to imaging. The reliability of this technique is validated on a number of homogenous surfaces. The measured electron yields are shown to be within the range of published data and the calculated signal-to-noise ratio compares favourably with that estimated from the image.

Item Type:	Article
Subjects:	T Technology > TA Engineering (General). Civil engineering (General)
Divisions:	Faculty of Engineering and Technology (FET)
Depositing User:	Ms Rosnani Abd Wahab
Date Deposited:	12 Sep 2011 02:27
Last Modified:	12 Sep 2011 02:27
URII:	http://shdl.mmu.edu.my/id/eprint/2256

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