Article

LUO, P and ZHOU, Z and CHAN, K and TANG, D and CUI, R and DOU, X (2008) Gas doping ratio effects on p-type hydrogenated nanocrystalline silicon thin films grown by hot-wire chemical vapor deposition. Applied Surface Science, 255 (5). 2910-2915 . ISSN 01694332

CHAN, K and TEO, B (2007) Investigation into the influence of direct current (DC) power in the magnetron sputtering process on the copper crystallite size. Microelectronics Journal, 38 (1). pp. 60-62. ISSN 00262692

CHAN, K and TOU, T and TEO, B (2006) Thickness dependence of the structural and electrical properties of copper films deposited by dc magnetron sputtering technique. Microelectronics Journal, 37 (7). pp. 608-612. ISSN 00262692