Citation
Polonski, Vitali V. and Yamamoto, Yoh and White, Jonathon D. and Kourogi, Motonobu (1999) Vacuum Shear Force Microscopy Application to High Resolution Work. Japanese Journal of Applied Physics, 38 (2). pp. 826-829. ISSN 0021-4922
Text
Vacuum Shear Force Microscopy Application to High Resolution Work.pdf Restricted to Repository staff only Download (473kB) |
Official URL: http://adsabs.harvard.edu/abs/1999JaJAP..38L.826P
Abstract
A new technique–Vacuum Shear Force Microscopy (VSFM)–is introduced as a reliable method for maintaining a constant separation between a probe and sample. Elimination of many of the instabilities observed when applying the shear force mechanism to imaging under ambient conditions, allows for routine nanometer lateral and sub-nanometer normal resolution. In this paper this technique is applied, firstly, to the imaging of microtubules (biology) and, secondly, to the patterning and subsequent imaging of nanoscale metal lines (nanofabrication).
Item Type: | Article |
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Subjects: | T Technology > TA Engineering (General). Civil engineering (General) |
Divisions: | Faculty of Engineering (FOE) |
Depositing User: | Ms Nurul Iqtiani Ahmad |
Date Deposited: | 11 Sep 2013 07:22 |
Last Modified: | 28 Oct 2013 04:05 |
URII: | http://shdl.mmu.edu.my/id/eprint/3980 |
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