Effects of phase explosion in pulsed laser deposition of nickel thin film and sub-micron droplets

Siew, W. O. and Yapl, S. S. and Yong, T. K. and Nee, C. H. and Tou, T. Y. (2011) Effects of phase explosion in pulsed laser deposition of nickel thin film and sub-micron droplets. Applied Surface Science, 257 (7). pp. 2775-2778. ISSN 0169-4332

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Official URL: http://dx.doi.org/10.1016/j.apsusc.2010.10.061

Abstract

Nickel (Ni) thin films were deposited on glass substrates in high vacuum and at room temperature with third-harmonic or 355-nm output from a nanosecond Nd:YAG laser. At low laser fluence of 1 J/cm2, the deposition rate was about 0.0016 nm/shot which increased linearly until 4 J/cm2. Above 4 J/cm2, the onset of phase explosion in the ablation abruptly increased the optical emission intensity from laser-produced Ni plume as well as thin-film deposition rate by about 6×. The phase explosion also shifted the size distribution and number density of Ni droplets on its thin-film surface. On the other hand, the surface structures of the ablated Ni targets were compared between the scan-mode and the fixed-mode ablations, which may suggest that droplets observed on the thin-film surface were caused by direct laser-induced splashing of molten Ni rather than vapour-to-cluster condensation during the plume propagation.

Item Type: Article
Subjects: T Technology > TA Engineering (General). Civil engineering (General)
Divisions: Faculty of Engineering (FOE)
Depositing User: Ms Rosnani Abd Wahab
Date Deposited: 27 Jan 2014 06:24
Last Modified: 27 Jan 2014 06:24
URI: http://shdl.mmu.edu.my/id/eprint/5013

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