Direct current magnetron sputter-deposited ZnO thin films

Krishnasamy, Jegenathan and Chan, Kah-Yoong and Hoon, Jian-Wei and Kamaruddin, Sharul Ashikin and Tou, Teck-Yong (2011) Direct current magnetron sputter-deposited ZnO thin films. In: International Conference On Photonics 2010. IEEE Xplore, p. 257. ISBN 978-1-4244-7186-7

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Abstract

Zinc oxide (ZnO) thin films were deposited on glass substrates at room temperature using direct current (DC) magnetron sputtering technique. The deposition pressure was varied from 12 mTorr to 25 mTorr. The influence of the deposition pressure on structural properties of the ZnO films was investigated using atomic force microscopy (AFM). The optical properties of the ZnO films were measured using Ocean Optics spectrometer. The experimental results reveal that the deposition pressure has an important role in the structural and optical properties of the ZnO films.

Item Type: Book Section
Subjects: T Technology > TA Engineering (General). Civil engineering (General)
Divisions: Faculty of Engineering (FOE)
Depositing User: Ms Rosnani Abd Wahab
Date Deposited: 24 Jan 2014 07:34
Last Modified: 24 Jan 2014 07:34
URI: http://shdl.mmu.edu.my/id/eprint/4990

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