Pneumatic Actioned Mechanism for Substrate Loading, Clamping and Unloading System in a Vacuum Sputtering Equipment

Citation

Ţarcă, Dan-Ioan and Crăciun, Dan and Ghincu, Remus Vladimir and Low, Kean Ong and Ţarcă, Ioan Constantin (2023) Pneumatic Actioned Mechanism for Substrate Loading, Clamping and Unloading System in a Vacuum Sputtering Equipment. In: 2023 17th International Conference on Engineering of Modern Electric Systems (EMES), 9-10 June 2023, Oradea, Romania.

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Abstract

The paper presents automating a clamping mechanism for a vacuum magnetron sputtering equipment and integrating it in the existing pneumatic control system. The clamping mechanism is a vital part of the whole magnetron sputtering deposition system, as it takes the substrate from the load-lock fork and puts it in place, aligned with the target, for the deposition process. After deposition, it puts it back on the fork of the load-lock in order to extract it from the equipment. By automating the procedures, we ensure that no accidents happen and that the substrate will always be in the correct position

Item Type: Conference or Workshop Item (Paper)
Uncontrolled Keywords: Vacuum, Sputtering, deposition, pneumatic, load lock.
Subjects: T Technology > TJ Mechanical Engineering and Machinery > TJ940-940.5 Vacuum technology
Divisions: Faculty of Engineering and Technology (FET)
Depositing User: Ms Nurul Iqtiani Ahmad
Date Deposited: 04 Sep 2023 07:06
Last Modified: 04 Sep 2023 07:06
URII: http://shdl.mmu.edu.my/id/eprint/11669

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